Surface Chemical Analysis
The main objective of this TWA is to produce by coordinated effort, the reference procedures, reference data and reference materials necessary to establish standards for surface chemical analysis. Such standards are needed because of the importance of surface analysis in modern technologies involving surface treatment or depositing films, eg microelectronics, ion implantation, coating and plasma processing.
To date, over 40 projects have been developed, mainly pertaining to the use of Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), secondary ion mass spectroscopy (SIMS) and sputter depth profiling (SDP) for qualitative and quantitative analysis. Some projects involve materials and their data, while others involve improved characterisation of instruments and the validation of algorithms.
This TWA has conducted 23 interlaboratory comparisons, provided improved reference data, developed improved reference materials (including two certified reference materials), provided improved data and information formats, and developed improved algorithms and software. Its work has led to the development of nineteen ISO documents and 2 ASTM standards and to the provision of a calibration service for AES and XPS spectrometers. TWA 2 has enabled more accurate and reliable surface analyses to be made, thereby stimulating the development and application of advanced materials in new technologies.
- Surface analysis of oxide nanoparticles
- Chemical composition of functionalized graphene with X-ray photoelectron spectroscopy (XPS)
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Dr. Ian Gilmore (Chair) email@example.com +44 (0)20 8943 6922