TWA 2
Surface Chemical Analysis
The main objective of this TWA is to produce by coordinated international effort, the reference procedures, reference data and reference materials necessary to establish international standards for surface chemical analysis, primarily in ISO TC 201 (Surface Chemical Analysis). Such standards are needed because of the importance of surface chemistry in a wide range of industrial sectors ranging from semiconductors and advanced materials through to Lifesciences and health.
TWA2 is split into 4 workstreams covering:
- Electron and optical spectroscopies (EOS)
- Mass spectroscopies (MS)
- Scanning probe microscopy (SPM)
- Data workflow, methods and best practice (DAT)
To date, over 50 projects have been completed which have contributed to over 30 international standards in ISO TC 201 and 2 ASTM standards. The TWA has improved reference data, developed improved reference materials (including two certified reference materials), provided improved data and information formats, and developed improved algorithms and software. TWA 2 has enabled more accurate and reliable surface analyses to be made, thereby stimulating the development and application of advanced materials in new technologies.
Current projects:
|
No |
Group |
Title |
|---|---|---|
|
A12 |
SPM |
Graphene layer-number characterization by Kelvin Probe
Force Microscopy |
|
A20 |
EOS |
Work function measurement by photoelectron
spectrometer |
|
A21 |
SPM |
Effects of temperature and humidity on dimensional AFM
nanoscale measurements |
|
A23 |
EOS |
Determination of the minimum detectability of surface
plasmon resonance device |
|
A24 |
SPM |
Guidelines for shape and size analysis of nanoparticles
by AFM |
|
A25 |
MS |
Interlaboratory study on atom probe quantification and
reproducibility |
|
A27 |
EOS |
XPS intensity calibration with poly(ethylene)
study |
|
A28 |
SPM |
SPM: calculate non-orthogonal angle and scale error
using sample reversal method |
|
A29 |
MS |
SIMS for biological analysis using drug dosed
calibration samples |
|
A30 |
MS |
Surface analysis of oxide nanoparticles |
|
A31 |
MS |
Evaluation of matrix effect correction and
investigation of interface determination |
|
A32 |
SPM |
Nano/micro adhesion measurements using AFM and
nanoindenters |
|
A33 |
EOS |
Chemical composition of functionalized graphene with X-ray
photoelectron spectroscopy (XPS) |
|
A34 |
EOS |
Analysis of air PM filters by XRF under grazing
incidence |
|
A35 |
EOS |
Thickness measurement of nanometer hetero oxide films
on Si(100) by mutual calibration with XPS, MEIS, RBS and LEIS |
|
A36 |
SPM |
Calibration of magnification for the measurement of
critical dimension by AFM |
|
A37 |
MS |
OrbiSIMS: Noise measurement and optimisation of
secondary ion transmission |
|
A38 |
SPM |
Elastic modulus measurement for compliant materials using
AFM |
|
A39 |
MS |
Spatial resolution in mass spectrometry
imaging |
|
A40 |
EOS |
TXRF Chemical measurement process |
|
A41 |
DAT |
Alignment procedure for identical location analysis between
different microscopic measuring instruments for surface chemical
analysis |
Publications List:
Select this link
More information
Dr. Ian Gilmore (Chair) ian.gilmore@npl.co.uk +44 (0)20 8943 6922