TWA 2

Surface Chemical Analysis

The main objective of this TWA is to produce by coordinated international effort, the reference procedures, reference data and reference materials necessary to establish international standards for surface chemical analysis, primarily in ISO TC 201 (Surface Chemical Analysis). Such standards are needed because of the importance of surface chemistry in a wide range of industrial sectors ranging from semiconductors and advanced materials through to Lifesciences and health.

TWA2 is split into 4 workstreams covering:

  1. Electron and optical spectroscopies (EOS)
  2. Mass spectroscopies (MS)
  3. Scanning probe microscopy (SPM)
  4. Data workflow, methods and best practice (DAT)

To date, over 50 projects have been completed which have contributed to over 30 international standards in ISO TC 201 and 2 ASTM standards. The TWA has improved reference data, developed improved reference materials (including two certified reference materials), provided improved data and information formats, and developed improved algorithms and software. TWA 2 has enabled more accurate and reliable surface analyses to be made, thereby stimulating the development and application of advanced materials in new technologies.

 

Complete Projects

No

Group

Title
Project leader

A12

SPM

Graphene layer-number characterization by Kelvin Probe Force Microscopy
Daisuke Fujita (Japan)

A20

EOS

Work function measurement by photoelectron spectrometer
Jeong Won Kim (Korea)

A21

SPM

Effects of temperature and humidity on dimensional AFM nanoscale measurements
Wenhao Huang

Active projects

No

Group

Title
Project leader

A23

EOS

Determination of the minimum detectability of surface plasmon resonance device
Jeongyong Kim, Soobong Choi

A24

SPM

Guidelines for shape and size analysis of nanoparticles by AFM
Daisuke Fujita, Keiko Onishi (Japan)

A25

MS

Interlaboratory study on atom probe quantification and reproducibility
Claudia Fleischmann

A27

EOS

XPS intensity calibration with poly(ethylene) study
Benjamen Reed (UK)

A28

SPM

SPM: calculate non-orthogonal angle and scale error using sample reversal method
SangHan Chung

A29

MS

SIMS for biological analysis using drug dosed calibration samples
Ian Gilmore / Jean-Luc Vorng (UK)

A30

MS

Surface analysis of oxide nanoparticles
Jeorg Radnik (Germany)

A31

MS

Evaluation of matrix effect correction and investigation of interface determination
Satoka Aoyagi (Japan)

A32

SPM

Nano/micro adhesion measurements using AFM and nanoindenters
Charles Clifford (UK)

A33

EOS

Chemical composition of functionalized graphene with X-ray photoelectron spectroscopy (XPS)
Jeorg Radnik (Germany)

A34

EOS

Analysis of air PM filters by XRF under grazing incidence
Laura Borgese

A35

EOS

Thickness measurement of nanometer hetero oxide films on Si(100) by mutual calibration with XPS, MEIS, RBS and LEIS
Kyung Joong Kim (Korea)

A36

SPM

Calibration of magnification for the measurement of critical dimension by AFM
Kyung Joong Kim (Korea)

A37

MS

OrbiSIMS: Noise measurement and optimisation of secondary ion transmission
Gus Trindade

A38

SPM

Elastic modulus measurement for compliant materials using AFM
So Fujinami / Ken Nakajima (Japan)

A39

MS

Spatial resolution in mass spectrometry imaging
Rory Steven (UK)

A40

EOS

TXRF Chemical measurement process
Diane Eichert

A41

DAT

Alignment procedure for identical location analysis between different microscopic measuring instruments for surface chemical analysis
Yoshiteru Yasuda (Japan)

A42

SPM

Nano-scale roughness measurement with different AFM instruments
Hiroshi Itoh (Japan)

A43

SPM

Determination of experimental parameters for quantitative MEIS analysis
Dr. WonJa Min (Korea)

A44

EOS

Quantitative imaging using NanoSIMS for biological materials
WoProf. Takuo Yasunaga (Japan)

A45

DAT

Comprehensive file format for the measurement and analysis of surface chemical analysis data
Takuo Yasunaga (Japan)

A46

EOS

Spectroscopic Imaging of Nanomaterials by Surface Analysis Methods
Jeong Won Kim / Tae Geol Lee (Korea)

A47

EOS

Evaluation of area selection fidelity in small-area XPS measurements
Jörg M. Stockmann / Jörg Radnik (Germany)

A48

EOS

Round robin test of three-dimensional nanoscale roughness artifacts with specified statistic quantities
Dr. Yushu Shi / Dr. Yuhang Chen (China)

 

Publications List:  Select this link

More information

Dr. Ian Gilmore, NPL, UK  (Chair)

Dr. Charles Clifford, NPL, UK  (Vice Chair)