Surface Chemical Analysis

TWA 2

Surface Chemical Analysis

The main objective of this TWA is to produce by coordinated international effort, the reference procedures, reference data and reference materials necessary to establish international standards for surface chemical analysis, primarily in ISO TC 201 (Surface Chemical Analysis). Such standards are needed because of the importance of surface chemistry in a wide range of industrial sectors ranging from semiconductors and advanced materials through to Lifesciences and health.

TWA2 is split into 4 workstreams covering:

Electron and optical spectroscopies (EOS)
Mass spectroscopies (MS)
Scanning probe microscopy (SPM)
Data workflow, methods and best practice (DAT)

To date, over 50 projects have been completed which have contributed to over 30 international standards in ISO TC 201 and 2 ASTM standards. The TWA has improved reference data, developed improved reference materials (including two certified reference materials), provided improved data and information formats, and developed improved algorithms and software. TWA 2 has enabled more accurate and reliable surface analyses to be made, thereby stimulating the development and application of advanced materials in new technologies.

Complete Projects

No	Group	Title Project leader
A12	SPM	Graphene layer-number characterization by Kelvin Probe Force Microscopy Dr. Daisuke Fujita (Japan)
A20	EOS	Work function measurement by photoelectron spectrometer Dr. Jeong Won Kim (Korea)
A21	SPM	Effects of temperature and humidity on dimensional AFM nanoscale measurements Dr. Wenhao Huang

Active projects

No	Group	Title Project leader
A23	EOS	Determination of the minimum detectability of surface plasmon resonance device Dr. Jeongyong Kim, Dr. Soobong Choi
A24	SPM	Guidelines for shape and size analysis of nanoparticles by AFM Dr, Daisuke Fujita (Japan), Keiko Onishi (Japan)
A25	MS	Interlaboratory study on atom probe quantification and reproducibility Dr. Claudia Fleischmann (Belgium)
A27	EOS	XPS intensity calibration with poly(ethylene) study Dr. Benjamen Reed (UK)
A28	SPM	SPM: calculate non-orthogonal angle and scale error using sample reversal method Dr. SangHan Chung
A29	MS	SIMS for biological analysis using drug dosed calibration samples Dr. Ian Gilmore / Jean-Luc Vorng (UK)
A30	MS	Surface analysis of oxide nanoparticles Dr. Jeorg Radnik (Germany)
A31	MS	Evaluation of matrix effect correction and investigation of interface determination Dr. Satoka Aoyagi (Japan)
A32	SPM	Nano/micro adhesion measurements using AFM and nanoindenters Dr. Charles Clifford (UK)
A33	EOS	Chemical composition of functionalized graphene with X-ray photoelectron spectroscopy (XPS) Dr. Jeorg Radnik (Germany)
A34	EOS	Analysis of air PM filters by XRF under grazing incidence Dr. Laura Borgese (Italy)
A35	EOS	Thickness measurement of nanometer hetero oxide films on Si(100) by mutual calibration with XPS, MEIS, RBS and LEIS Dr. Kyung Joong Kim (Korea)
A36	SPM	Calibration of magnification for the measurement of critical dimension by AFM Dr. Kyung Joong Kim (Korea)
A37	MS	OrbiSIMS: Noise measurement and optimisation of secondary ion transmission Dr. Gustavo Trindade (UK)
A38	SPM	Elastic modulus measurement for compliant materials using AFM Dr. So Fujinami / Dr. Ken Nakajima (Japan)
A39	MS	Spatial resolution in mass spectrometry imaging Dr. Rory Steven (UK)
A40	EOS	TXRF Chemical measurement process Dr. Diane Eichert
A41	DAT	Alignment procedure for identical location analysis between different microscopic measuring instruments for surface chemical analysis Dr. Yoshiteru Yasuda (Japan)
A42	SPM	Nano-scale roughness measurement with different AFM instruments Dr. Hiroshi Itoh (Japan)
A43	SPM	Determination of experimental parameters for quantitative MEIS analysis Dr. WonJa Min (Korea)
A44	EOS	Quantitative imaging using NanoSIMS for biological materials Prof. Takuo Yasunaga (Japan)
A45	DAT	Comprehensive file format for the measurement and analysis of surface chemical analysis data Prof. Takuo Yasunaga (Japan)
A46	EOS	Spectroscopic Imaging of Nanomaterials by Surface Analysis Methods Dr. Jeong Won Kim / Dr. Tae Geol Lee (Korea)
A47	EOS	Evaluation of area selection fidelity in small-area XPS measurements Dr. Jörg M. Stockmann / Dr. Jörg Radnik (Germany)
A48	EOS	Round robin test of three-dimensional nanoscale roughness artifacts with specified statistic quantities Dr. Yushu Shi / Dr. Yuhang Chen (China)
A49	DAT	OrbiSIMS Metrology: linearity of the intensity scale and implications to data processing Dr. Gustavo Trindade (UK)
A50	EOS	Determination of shell thickness and chemistry of core-shell nanoparticles using X-ray photoelectron (XPS) spectroscopy Dr. David Cant (UK) / Dr Peter Sjövall (Sweden)
A51	EOS	Analysis of the amount of surface functional groups on silica nanoparticles using X-ray photoelectron (XPS) spectroscopy and Secondary Ion Mass Spectrometry (SIMS). Dr Jörg Radnik (Germany) / Dr Peter Sjövall (Sweden)
A52	EOS	Method for AFM sub-nanometer z-linearity and z-calibration using stepped surfaces Dr. Gheorghe Stan (USA)

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More information

Dr. Ian Gilmore, NPL, UK (Chair)

Dr. Charles Clifford, NPL, UK (Vice Chair)

Canada	.	France	.	Germany	.	Italy	.	Japan	.	UK	.	USA	.	EC	.	Brazil	.	Mexico	.	Chinese Taipei	.	South Africa	.	Australia	.	Korea	.	India	.	China
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